无尘擦拭布

savina minimax擦拭布是日本KBSEIREN株式会社（原KANEBO）开发的目前最高级的无尘擦拭布系列产品，吸水吸油性极强，不磨损原件。广泛用于光学镜头制造，办公器材保养，10级以上的无尘车间净化室，半导体生产线车间等领域。 

日本KANEBO公司生产的HITECLOTH 超细纤维无尘布是由Belima.X织成，其不规则的纤维排布组成适用于各种不规则物体的细微表面处理，不会掉绒毛，超柔软布质及高度抗磨损特性可应用于精密仪器之保养 

 规格：24CM X 24CM

用途：适用于光盘、硬盘、软盘、液晶和其他项目偏转板、隐形眼镜、电路板清洁、医学生产线清洁、摄象机镜头的清洁、半导体和集成电路的生产、LCD,TFT,光学，光电及影片清洁等生产过程无尘车间净化室、半导体生产线车间等领域。

尺寸：7*7cm、15*15cm、24*24cm、50*50cm、100*100cm.
High technology fields are growing every day in sophistication and precision. Highly efficient wiping cloths are essential for a strict dust-free environment in the manufacturing of such products as LSIs and LCDs. Savina Minimax was created to readily meet the needs of the times, with excellent functions enough to cope with the ultimate dust-free condition in super clean rooms.

Savina Minimax and other Savina wiping cloths are sophisticated, high-performance wiping cloths to cope with the ultimate dust-free condition in super clean rooms and similar environments. Without releasing lint, they clean instruments, apparatuses and peripheral equipment used in a clean room, while also absorbing and removing any undesired moisture
 

Wipers for use in clean rooms should clean all instruments, apparatuses and peripheral devices while causing no contamination. They are also required to absorb and remove any undesired moisture. Savina Minimax, which contains all properties needed for such wipers, is one of the highest-performance wiping cloths designed for the age of high technology.

Super High-Shrinkage, High-Density Finish

Cross section of Savina Minimax

Surface of Savina Minimax

After knitting on a special high gauge knitting machine, the greige for Savina Minimax is shrunken both lengthwise and widthwise to as much as 40% of its original dimension. It is not treated with binders of any kind to achieve such a dense construction. The resultant wiping cloth has as high a surface area as 25,700 c㎡/g, thus ensuring dust removal without releasing any lint. Conventional wiping cloths have a surface area of only 2,420 c㎡/g.

Features

• Generates only a minuscule amount of lint.
• Absorbs and retains water quickly and positively.
• Has lower dissolution of residual ions and other substances.
• Provides high wiper performance (removes a maximum amount of dust without contaminating the clean room equipment).

Applications

• Production processes for photomagnetic disks, hard disks and floppy disks
• Production processes for deflection plates of liquid crystals and other items
• Compact and magnetic disk production processes
• Video deck production processes
• Contact lens production processes
• Camera assembly lines
• Printed circuit board cleaning processes
• Cleaning processes for camera lenses before coating
• Medicine production line cleaning processes
• Movie film cleaning process
• Production processes for semiconductors and integrated circuits
• Workpiece cleaning process before precision coating